Event ·Multi-source

LLM在EDA前端设计中的挑战与机遇

这篇论文讨论了LLM在电子设计自动化（EDA）前端设计中的应用，指出其可在HDL生成、测试台构建和设计空间探索等任务中作为统一接口。文章回顾了从局部辅助到自主代理执行的演变，并介绍了OpenClaw等先驱系统。还分析了LLM在电路生成和高级综合中提升设计质量的现有进展。最后，论文总结了集成LLM的关键挑战和未来机遇。

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这篇论文系统梳理了LLM在芯片前端设计中的应用，从HDL生成到设计空间探索，还介绍了OpenClaw等代理AI方案，适合关注EDA与AI结合的读者。

4 sources33° AI heatLast updated 2026/7/10 17:15:54

Evidence

4 sources

Primary sourcearXiv cs.LG

2026/7/10 17:15:54View source

Related source 1Hunyuan

2026/7/9 06:55:34View source

Related source 2IT之家

2026/7/10 00:55:30View source

Related source 3andrew chen

2026/7/10 21:39:43View source

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